SUBSTRATE TREATMENT DEVICE

摘要

PURPOSE: A vapour suction arrangement is provided to draw off vapour in an area of a lift arrangement placed over treatment fluid. CONSTITUTION: Treatment fluid flows to a fluid container(1) through an inlet tube(15). Then the treatment fluid is drawn off from an overflow slot(16) placed along an upper edge of the fluid container(1). Vapour in a lift arrangement(8) area is drawn off through a plate(17) including pipes connected to an elbow element(20). A housing(9) of the lift arrangement(8) covers a part of the fluid container(1) to cover the area of the lift arrangement(8) placed over the fluid container(1) connected to a support arm(7).