APPARATUS AND METHOD FOR DETECTING DEFECT IN PATTERNED SUBSTRATE

摘要

PURPOSE: A method for detecting a defect in a patterned substrate is provided to reduce a time overhead related to a transfer of a mechanical stage and to improve a throughput, by having a plurality of columns interconnected. CONSTITUTION: A method for detecting a defect in a patterned substrate comprises the steps of: having a field of view(FOV) and positioning a charged-particle-beam optical column having a uniform fineness regarding the FOV, on the patterned substrate; maintaining to fix the charged-particle-beam optical column on the patterned substrate while injecting charged-particle beam regarding the patterned substrate, so that the charged-particle-beam optical column is operated to obtain an image regarding a plurality of small regions in a region of the patterned substrate; and comparing a reference with the image obtained to distinguish the defect of the patterned substrate.