发明名称 DEVICE FOR SHAPING AN ELECTRON BEAM, METHOD FOR PRODUCING SAID DEVICE AND USE THEREOF
摘要 The invention relates to an extremely low-capacitance device for forming an electron beam. The device is based on a ceramic body having a monolithic multilayer structure. The ceramic body is produced using LTCC technology, whereby said method is modified in a targeted manner. The body is made of presintered ceramic layers, whose lateral shrinkage is suppressed. The through holes of the electrodes for the electron beam are thus exactly arranged coaxially and tolerances for the dimensions of the electrodes are decoupled from shrinkage during sintering. Such a device makes it possible to focus the electron beam of an electron gun and modulate its intensity.
申请公布号 WO9963566(A3) 申请公布日期 2000.08.24
申请号 WO1999DE01610 申请日期 1999.06.01
申请人 SIEMENS AKTIENGESELLSCHAFT;BURKHARDT, KLAUS;ECKHARDT, WOLFGANG;GOHLKE, SILVIA;MAENNER, RUTH;WERSING, WOLFRAM 发明人 BURKHARDT, KLAUS;ECKHARDT, WOLFGANG;GOHLKE, SILVIA;MAENNER, RUTH;WERSING, WOLFRAM
分类号 H01J3/02;H01J9/18;H01J37/12 主分类号 H01J3/02
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