发明名称 |
X-ray analysis position comparison and spectral analysis, comprises altering spectral position of diffraction lines by single defined change in position of test item, and repeating measurement of emission spectrum |
摘要 |
In a first stage the spectral position of the diffraction lines is altered by a single defined change in the position of the test item, followed by a repeat measurement of the emission spectrum and comparison of the emissions against the two positions. Those parts of the spectrum which remain unchanged are separated and analyzed by conventional X-ray fluorescent analysis. In a first stage the spectral position of the diffraction lines is altered by a single defined change in the position of the test item, followed by a repeat measurement of the emission spectrum and comparison of the emissions against the two positions. Those parts of the spectrum which remain unchanged are separated and analyzed by conventional X-ray fluorescent analysis. The positions measured are determined using the first-stage diffraction lines and determination of the characteristic crystalline values of the test items, and detection of mono-crystalline zones (m) within the test item. The final stage systematically repeats determination of the characteristic crystalline values, and determines the symmetrical elements within the crystal structure and/or the crystal orientation using a conventional crystallography process.
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申请公布号 |
DE19936900(A1) |
申请公布日期 |
2000.08.24 |
申请号 |
DE1999136900 |
申请日期 |
1999.07.29 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
KAEMPFE, BERND;HANSCHKE, MICHAEL |
分类号 |
G01N23/223;(IPC1-7):G01N23/20 |
主分类号 |
G01N23/223 |
代理机构 |
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