发明名称 Verfahren zur Herstellung einer supraleitenden Dünnschicht aus hoch-temperatur-supraleitenden-Oxid
摘要 A method for preparing a thin film formed of an oxide superconductor on a substrate by emitting molecular beams of constituent elements of the oxide superconductor to the substrate under high vacuum, wherein at first a molecular beam of one of the constituent elements of the oxide superconductor, of which an oxide thin film can be deposited so as to have a smooth surface, is emitted so as to form the oxide thin film of one or two unit cells. And then, all the molecular beams of constituent elements of the oxide superconductor are emitted to the oxide thin film so as to form the oxide superconductor thin film. <IMAGE>
申请公布号 DE69328537(T2) 申请公布日期 2000.08.24
申请号 DE1993628537T 申请日期 1993.11.17
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NAKAMURA, TAKAO
分类号 C01G1/00;C01G3/00;C30B23/02;C30B23/08;C30B29/22;H01B12/06;H01B13/00;H01L39/24 主分类号 C01G1/00
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