发明名称 Device for treatment of a substrate
摘要 A device for treating a substrate in which the cage-like body of the device can be made smaller and in which the waiting time in the treatment parts and the workpiece exchange time can be shortened is achieved as follows: there are two cassette receiving parts, one exposure part and one alignment part arranged in two rows. Furthermore the alignment part and the first cassette receiving part are located in the direction in which a first arm and a second arm of a workpiece transport device extend. Moreover, the two treatment parts and a second cassette receiving part are arranged such that the distances between them are identical to the distance between the first arm and the second arm. The first arm and the second arm move in the Y-direction, are extended or retracted in the X-direction at the same time, and fix the workpiece by the workpiece holding parts which are located on their tips. The workpiece is removed from the cassette of the first cassette receiving part and transported to the treatment parts. The already treated workpiece is received into the cassette of the second cassette receiving part. <IMAGE>
申请公布号 EP1030347(A1) 申请公布日期 2000.08.23
申请号 EP20000103151 申请日期 2000.02.16
申请人 USHIODENKI KABUSHIKI KAISHA 发明人 SHIBUYA, ISAMU
分类号 H01L21/68;G03F7/20;H01L21/027;H01L21/677 主分类号 H01L21/68
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