发明名称 SUBSTRATE TREATING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate treating device which can reduce the possibility of swallowing up the outside air. SOLUTION: A carrying-in/out robot 20 holds a substrate W by means of its handling arm 21 and horizontally inserts the arm 21 into a chamber 10 from a pre-cleanroom 15. When the substrate W reaches a transferring position, the forward movement of the arm 21 is stopped and, at the same time, a substrate transferring section 30 ascends and receives the substrate W from the arm 21. Then the robot 20 horizontally retreats the arm 1 and causes the arm 21 to withdraw to the outside of a chamber 10 from the pre-cleanroom 15. In taking out the substrate W, the robot 20 reversely carries out the operations. Since the robot 20 does not make elevating/lowering operations when the robot 20 carries in/out the substrate W, the opening area of the pre-cleanroom 15 can be reduced by making the height of the opening lower. Therefore, the possibility of swallowing up the outside air can be reduced.</p>
申请公布号 JP2000232150(A) 申请公布日期 2000.08.22
申请号 JP19990031326 申请日期 1999.02.09
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KOBAYASHI TOSHIYUKI
分类号 H01L21/302;G02F1/13;G02F1/1333;H01L21/205;H01L21/3065;H01L21/68;H01L21/683;(IPC1-7):H01L21/68;H01L21/306 主分类号 H01L21/302
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