发明名称 PHOTO SOLDER RESIST INK
摘要 PROBLEM TO BE SOLVED: To provide an ultraviolet curing photo solder resist ink which is used for forming a permanent protective film small in halogen content. SOLUTION: This photo solder resist ink contains (A) ultraviolet curing resin possessed of an unsaturated ethylene and a carboxyl group as side chains, (B) a multifunctional epoxy compound, (C) organic coloring pigment, (D) a photopolymerization initiator, and (E) organic solvent, where the organic coloring pigment is selected out of organic coloring pigments which contain no halogen in their chemical structural formulas, and the halogen content of the hardened photo solder resist ink is 50 ppm or less.
申请公布号 JP2000232264(A) 申请公布日期 2000.08.22
申请号 JP19990237005 申请日期 1999.08.24
申请人 GOO CHEMICAL CO LTD 发明人 INOUE TAKUZO;HASHIMOTO SOICHI
分类号 H05K3/28;G03F7/004;G03F7/027;G03F7/038 主分类号 H05K3/28
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