发明名称 SUBSTRATE TREATING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To suitably treat a substrate by properly detecting exhaust wind speed. SOLUTION: In substrate treating equipment 1 performing a prescribed treatment by supplying treating liquid to a substrate W, an exhaust pipe 20 for exhausting the air in a treating part 10 is installed below the treating part 10, which holds and treats the substrate W. In the exhaust pipe 20, a wind speed measuring device 30, having an anemosensor 33 detecting exhaust wind speed in the exhaust pipe 20 and a first shielding plate 31 which is arranged at least on the windward side of the anemosensor 33, is arranged. In the wind speed measuring device 30, sticking of mist of treating liquid to the anemosensor 33 can be reduced by the shielding plate 31 which is arranged on the windward side of flow of exhaust air, so that the exhaust air speed of the exhaust pipe 20 can be detected satisfactorily. By controlling the opening and closing action of a damper 50 with a control part 40 on the basis of output of the wind speed measuring device 30, the exhaust wind speed due to the exhaust pipe 20 can be maintained in a constant state.
申请公布号 JP2000232050(A) 申请公布日期 2000.08.22
申请号 JP19990031297 申请日期 1999.02.09
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MORITA AKIHIKO
分类号 B05D1/40;B05C11/00;B05C11/08;B05D3/00;B05D7/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 B05D1/40
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