发明名称 POSITIVE SILICONE-CONTAINING PHOTOSENSITIVE COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a high sensitivity and high resolution by incorporating a silicone-contg. polymer having a specified siloxane structure, a compd. which produces an acid by irradiation with active rays or a radiation, and a specified polymer. SOLUTION: The compsn. contains a polymer having a structure expressed by formula I and/or formula II which is insoluble with water and soluble with alkali, a compd. which produces an acid by irradiation with active rays or a radiation, and a polymer expressed by formula III. In formulae, X is selected from groups expressed by -C(=O)-R or the like or carboxyl groups, R is hydrogen atom or a hydrocarbon group, R' to R""' are selected from hydroxyl groups or alkyl groups, Y is an alkyl group or the like, R0 is selected from hydrogen atom, a halogen atom or the like, and each of l, m, n and q is 0 or a positive integer, p is a positive integer, each of R1 to R3 and R5 to R7 is hydrogen atom or the like, and each of R4 and R8 is a specified divalent to pentavelent group.
申请公布号 JP2000231195(A) 申请公布日期 2000.08.22
申请号 JP19990031591 申请日期 1999.02.09
申请人 FUJI PHOTO FILM CO LTD 发明人 YASUNAMI SHOICHIRO
分类号 H01L21/027;G03F7/039;G03F7/075 主分类号 H01L21/027
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