发明名称 |
Photoresist application for a circlet wafer |
摘要 |
Apparatus and method for depositing fluids on both sides of a semiconductor wafer that has a central opening are provided. In one aspect, the apparatus includes a mandrel for holding the wafer and a motor coupled to the mandrel and that is operable to rotate the mandrel. The apparatus also includes means for dispensing a first volume of fluid on the semiconductor wafer and a second volume of fluid on the semiconductor wafer. According to the method, a semiconductor wafer is coupled to a rotatable mandrel. The mandrel is rotated to spin the semiconductor wafer and a semiconductor processing fluid is sprayed on the first and second sides of the semiconductor wafer.
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申请公布号 |
US6106618(A) |
申请公布日期 |
2000.08.22 |
申请号 |
US19980088783 |
申请日期 |
1998.06.01 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
GILMER, MARK C.;GARDNER, MARK I. |
分类号 |
B05B9/04;B05B13/02;B05C9/14;B05C11/08;G03F7/16;H01L21/00;(IPC1-7):B05C11/02;B05C13/00;B05C9/06;B05B3/02 |
主分类号 |
B05B9/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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