| 摘要 |
A thin film magnetic head is capable of providing sufficient characteristics as an interlayer insulation layer even when a low temperature heat treatment is performed, and improving throughput of a process. The thin film magnetic head is fabricated by forming a protective layer 2 on a substrate 1, forming a lower shield 3 on the protective layer 2, forming a reading MR portion 4 on the lower shield 3, and forming an insulation layer 5 as a gap layer. A soft magnetic material layer of permalloy is formed as a common pole 6. On the common pole 6, a negative type photoresist 7 is applied. A patterning is performed by irradiating a light via an insulation layer pattern mask 9 and performing etching by a developer. Then, heat treatment is performed at a temperature lower than or equal to 200 DEG C. under inert atmosphere to form an interlayer insulation layer. Over this, a coil 8 is formed. In order to save a step, a negative type photoresist 7 is applied to form an interlayer insulation layer.
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