发明名称 RADIATION SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To obtain a compsn. which effectively responds to various kinds of radiation and which has good sensitivity, resolution and pattern profile by incorporating a specified copolymer in which the polymer main chain is formed by anionic polymn., and a radiation-sensitive acid producing agent. SOLUTION: The compsn. contains a copolymer having recurring units expressed by formula I and formula II, a copolymer having recurring units expressed by formula I and formula III with the polymer main chain formed by anionic polymn., and a radiation-sensitive acid producing agent. In the formulae, each of R1 and R2 is hydrogen atom or methyl group, R3 is a 4-10C tertiary alkyl group, each of R4 and R5 is hydrogen atom or methyl group independently of the other, R6 is a 1-4C alkyl group, R7 is a 1-6C alkyl group or R6 and R7 are coupled with each other to represent a divalent hydrocarbon group which forms a 6 to 8-member heterocycle with oxygen atom in formula III.
申请公布号 JP2000231193(A) 申请公布日期 2000.08.22
申请号 JP19990030912 申请日期 1999.02.09
申请人 JSR CORP 发明人 KOBAYASHI HIDEKAZU;YOKOYAMA KENICHI;HARA HIROMICHI
分类号 H01L21/027;C08K5/02;C08K5/36;C08K5/41;C08K5/42;C08L25/18;G03F7/004;G03F7/039 主分类号 H01L21/027
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