发明名称 |
Ammonium chloride vaporizer cold trap |
摘要 |
The present invention comprises means for sublimating and handling ammonium chloride (NH4Cl) vapor, a bi-product of a silicon nitride growth process, thereby preventing backstreaming into the reactor and ingestion of vapor and particulates by the vacuum pump. The exhaust circuit comprises a novel combination of valves, sublimation and cold traps, cooling and heating elements to facilitate reduction of condensed NH4Cl volume from a first path trap thus reducing maintenance, increasing production up-time and enhancing product yield.
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申请公布号 |
US6107198(A) |
申请公布日期 |
2000.08.22 |
申请号 |
US19980048212 |
申请日期 |
1998.03.26 |
申请人 |
VANGUARD INTERNATIONAL SEMICONDUCTOR CORPORATION |
发明人 |
LIN, WEI-FARN;HUNG, CHENG-CHANG |
分类号 |
C23C16/34;C23C16/44;(IPC1-7):H01L21/44;H01L21/31;B05C11/00;C23C16/00 |
主分类号 |
C23C16/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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