| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a method for correcting a scattering stencil type reticle capable of obtaining a reticle having high electron beam scatterability. SOLUTION: This method consists of correcting a defect generated when manufacturing the reticle which has pattern transferred parts composed of an electron beam scattering body and is used for transfer of a reduction stepped transfer image to a substrate to be transferred. A defective part is removed by irradiating the defective part with charge particles beam while supplying a gas containing at least a halogen-base compound.</p> |
