发明名称 UNIVERSAL CHUCKING MECHANISM FOR SEMICONDUCTOR WAFER
摘要 <p>PROBLEM TO BE SOLVED: To provide a universal chucking mechanism for wafers, which can be used commonly to semiconductor wafers of different diameters to vacuum chuck and cut or polish the wafers. SOLUTION: Hollow communication pipes 5h having valve seats 5s of ball valves 5z at a plurality of annular grooves 4a to 4d are erected, the floatable ball valves held by upper compression springs 5j and lower compression springs 5i are present to float at a position higher than the valve seats within the communication pipes, one ends of the communication pipes at the location of the presence of the lower springs are horizontally sealed an automatic switching mechanism 5 is provided at a lower surface of a frame body 4, having a ventilation pipe communicating with central recess parts at the other ends, a hollow pipe 8 journaling these frame body 4 and an automatic switching mechanism 5 is provided, and a hollow shaft 7 is provided within a hollow shaft 8 and the shaft 7 communicates at its upper end with a central recess 5f of the automatic switching mechanism 5 and communicates at its lower end with a vacuum eguipment.</p>
申请公布号 JP2000232083(A) 申请公布日期 2000.08.22
申请号 JP19990070657 申请日期 1999.02.10
申请人 OKAMOTO MACHINE TOOL WORKS LTD 发明人 SEKIDA SABURO;KASHIWA MORIYUKI
分类号 B23Q3/08;H01L21/304;H01L21/68;H01L21/683;(IPC1-7):H01L21/304 主分类号 B23Q3/08
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