发明名称 |
Exposure method and exposure apparatus using it |
摘要 |
An exposure method includes the phase-shifting mask supply step, the phase-shifting mask being prepared by selectively forming a light-shielding portion and a phase shifter on a substrate, and the resist exposure step of performing both exposure of a resist by dark field illumination light and exposure of the resist by bright field illumination light by using the phase-shifting mask, thereby removing residual resist generated by the influence of the edge of the phase shifter.
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申请公布号 |
US6107013(A) |
申请公布日期 |
2000.08.22 |
申请号 |
US19970990097 |
申请日期 |
1997.12.12 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
FUJISAWA, TADAHITO;TANAKA, SATOSHI;MIMOTOGI, AKIKO;MIMOTOGI, SHOJI;INOUE, SOICHI |
分类号 |
G03F1/08;G03F1/00;G03F7/20;H01L21/027;H01L21/28;H01L21/768;(IPC1-7):H01L21/027 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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