发明名称 |
METHOD OF HOT-FILAMENT CHEMICAL VAPOR DEPOSITION OF DIAMOND |
摘要 |
A hot-filament assisted CVD process is disclosed for depositing diamond crystals and diamond films on a substrate (2). The substrate is positioned at a distance from a hot filament (9) in a reaction chamber (1). A liquid precursor solution (6) of methanol is introduced into the reaction chamber through a liquid flow controller (8) and is vaporized. The filament (9) is heated to a sufficient high temperature so that the vapor of the precursor (b) is dissociated to produce etchant radicals and carbon containing radicals for diamond deposition.
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申请公布号 |
WO0047795(A1) |
申请公布日期 |
2000.08.17 |
申请号 |
WO2000US03471 |
申请日期 |
2000.02.10 |
申请人 |
AUBURN UNIVERSITY INDUSTRIAL PROGRAMS & TECH TRANSFER |
发明人 |
TZENG, YONHUA |
分类号 |
C23C16/27;(IPC1-7):C23C16/26 |
主分类号 |
C23C16/27 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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