| 摘要 |
PURPOSE: A method for automatically monitoring a wavelength of a semiconductor etching device is to improve an operation efficiency and to provide an easy data analysis. CONSTITUTION: An auto monitoring method of a wavelength of a semiconductor etching device having chamber, a wavelength detector, controller, and personal computer, comprises the steps of: controlling the wavelength detector by a process parameter for automatically monitoring a wavelength, downloaded from the personal computer, automatically monitoring a signal wavelength generated from the chamber, and transmitting the monitored wavelength data; and analyzing a quality and quantity of the substance in the chamber by comparing the monitored data with a specific wavelength stored in the database, displaying the analyzed data, and storing the same with a text file; and monitoring the displayed data, and correcting the wavelength detector when an error is detected.
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