发明名称 |
FLUID FILTER IN PROCESS FOR MANUFACTURING SEMICONDUCTOR |
摘要 |
PURPOSE: A fluid filter in a process for manufacturing a semiconductor is provided to maximize filtering efficiency, by preventing a serious defect caused by a leakage phenomenon in a specific portion, and by eliminating the need for a plurality of filters. CONSTITUTION: In a fluid filter in a process for manufacturing a semiconductor having a filtering film for filtering impurities included in fluid, inside/outside frames for fixing the filtering film, an O-ring for sealing for preventing a leakage, and a housing for surrounding the filtering film, the frames, and the O-ring, the filter has at least two different filtering films in the housing, the filtering films being composed of a double media structure of a double-fold pleat.
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申请公布号 |
KR20000051081(A) |
申请公布日期 |
2000.08.16 |
申请号 |
KR19990001323 |
申请日期 |
1999.01.18 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, JUNG SEON;KIM, HYEONG SUK;JEON, JAE KANG;HONG, SA MUN |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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