Apparatus for plasmatic processes

摘要

A plasma processing apparatus includes at least one pair of a first rotary permanent magnet system (1) and a second rotary permanent magnet system (2) The rotary permanent magnet systems further include individual permanent magnets (3) and are positioned opposite to each other. The individual permanent magnets (3) have a maximum magnetic induction of more than 10-1 Tesla. Additionally a driver system (4) for driving a motion of the rotary magnet systems (1, 2) is used in combination with a basic plasma processing device (5). By means of the rotary permanent magnet systems time variable magnetic flux lines (6) will be formed for affecting the plasma (7) produced by the plasma processing device (5). The apparatus additionally utilizes a control system (11) comprising a sensor system (12) and a feedback system (13) connected to the driver system for controlling motion of the permanent magnets of the rotary permanent magnet systems with respect to changes in the plasma produced by the basic plasma processing device (5).