METHOD FOR PREPARINF SINGLE CRYSTAL THIN FILM

摘要

PURPOSE: A method for preparing a single crystal thin film is provided which is improved uniformity of etching during manufacturing semiconductor integrated circuits and reliability of product. CONSTITUTION: A method for preparing a single crystal thin film comprises; the process for preparing the first single crystal board; the process for growing the first single crystal board and the other single thin-film, which is different in chemical character, in the first single crystal board using the epitaxial growth technique; and the process for separating the single crystal thin film from the first single crystal board.