| 摘要 |
PURPOSE: An apparatus for cleaning a dresser is provided to perform a dressing operation regarding a polishing pad by eliminating slurry adhered to a diamond disc. CONSTITUTION: An apparatus for cleaning a dresser(16) comprises a dresser receiving cup(20), at least one spraying element(22), an exhaust element(26). The dresser receiving cup receives a predetermined depth of a receiving space for receiving the dresser dressing a polishing pad(12) to polish a surface of a wafer, adhered to a surface of a polishing table(10). The at least one spraying element is installed in the receiving space of the dresser receiving cup and sprays cleaning solution toward the dresser positioned in the receiving space. The exhaust element exhausts the cleaning solution sprayed from the spraying element to the dresser, installed in the receiving space of the dresser receiving cup.
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