APPARATUS FOR DETECTING PRESSURE FOR SEMICONDUCTOR PROCESSING MACHINE

摘要

PURPOSE: An apparatus for detecting pressure for semiconductor processing machine is provided to detect an actual inner pressure of a chamber. CONSTITUTION: A pressure detector(200) detects an inner pressure of a chamber performing LPCVD, diffusion, or etching process with low or vacuum state. It includes a case(210), a diaphragm(220), a pressure converter(230), and a display(240). An inner space of a case is divided to reference(211) and general(212) pressure rooms by a diaphragm. A pressure of a reference room is same to an atmospheric pressure because it includes an inlet tube(213) directed to an outer atmosphere. A general pressure room having an inlet tube (214) is same to an inner one of a chamber(10). Then a shape of a diaphragm is transformed by a pressure difference between two rooms. A pressure converter placed at inside of a reference room detects the pressure of a general pressure room according transform action of a diaphragm. A display connected to a signal transmission line(231) shows an inner pressure of a general pressure room with a detected signal of a pressure converter.