发明名称 BLACK MATRIX STRUCTURE HAVING NONCONDUCTIVE PATTERN AND METHOD THEREOF
摘要 PURPOSE: A method for manufacturing a black matrix structure having a non conductive pattern is provided to improve a brightness of a cathode-ray-tube by pushing electron beam from a black matrix pattern to be collected to a fluorescent body. CONSTITUTION: A method for manufacturing a black matrix structure having a non conductive pattern comprises the steps of: forming a first photoresist resin layer(14) by applying photoresist resin solution on the entire surface of a cleaned face panel(12) and selectively eliminating the first photoresist resin layer by a photolithography process using a mask(MSK1) with a desired first pattern printed; forming a layer(16) by applying carbon black on the entire surface of the first photoresist resin layer and forming a nonconductive pattern(CB) of carbon black on a panel(2) by etching the first photoresist resin layer(14); forming a second photoresist resin layer(18) on the entire surface of the nonconductive pattern and eliminating the second photoresist resin layer(18) by a predetermined area on both sides of the nonconductive pattern by a photolithography process using a mask(MSK2) with a desired second pattern printed; and forming a layer(16) by applying graphite on the entire surface of the photoresist resin layer(18) and forming a black matrix pattern(BM) of graphite on the panel(12) by eliminating the photoresist resin layer by etching.
申请公布号 KR20000052046(A) 申请公布日期 2000.08.16
申请号 KR19990002847 申请日期 1999.01.29
申请人 SAMSUNG SDI CO., LTD. 发明人 HONG, CHEOL SU
分类号 H01J29/45;(IPC1-7):H01J29/45 主分类号 H01J29/45
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