发明名称 POLY SILICON THIN FILM TRANSISTOR FOR PIXEL FORMATION AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A poly silicon thin film transistor for a pixel formation and a fabricating method thereof are provided to prevent an electron and a hole from being stacked on a channel to stabilize a poly silicon TFT characteristics. CONSTITUTION: A gate line(40a) and a data line(44a) on which a gate signal and a data signal are respectively applied are composed. A common electrode line(42a) is respectively composed for the gate line. A poly silicon thin film transistor of which a gate and a source are respectively connected to the gate line and the data line is connected. A predetermined part of the main body of the thin film transistor is electrically connected to the common electrode line through a predetermined connecting line. The drain of the poly silicon thin film transistor connected to a pixel electrode(46) is opposite to the common electrode line to form a storage capacitor.
申请公布号 KR20000052177(A) 申请公布日期 2000.08.16
申请号 KR19990003082 申请日期 1999.01.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, JU HYEONG
分类号 G02F1/136;(IPC1-7):G02F1/136 主分类号 G02F1/136
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