STABILIZED DEVICE OF SLURRY FOR WAFER POLISHING

摘要

PURPOSE: A stabilized device of a slurry for a wafer polishing is provided by stabilization of the slurry through precipitating the large particles of the slurry in a supplying equipment of the slurry. CONSTITUTION: A method of manufacturing the stabilized device of the slurry for the wafer polishing consists of: a stabilized device of the slurry to be installed between the transferring lines of the slurry from a supply unit(drum unit) to a mixing module; the first precipitation unit to store and stabilize the slurry to be flowed in from the drum unit; the second precipitation unit to stabilize the stabilized slurries to be supplied from the first precipitation unit during transferring continuously; the outlet pipes to be connected to the bottoms of the first and the second precipitation units, and to exhaust the precipitation on the bottom of units.