CVD DEVICE, FILM FORMING METHOD AND PRODUCTION OF MAGNETIC RECORDING MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a thermal filament-plasma CVD device improved so as to prevent the secular variation of a film forming rate at the time of continuously forming a film consisting essentially of carbon. SOLUTION: As to this thermal filament-plasma CVD device, the state of a gaseous starting material for film formation is made into the one of plasma by discharge between filamentlike cathode and anode heated under a vacuum condition in a film forming chamber, and then, the plasma is acceleratedly bombarded against the surface of a substrate by a minus potential to form a film. In this case, the cathode is composed of metallic carbide.