发明名称 CLEANING APPARATUS
摘要 PROBLEM TO BE SOLVED: To always maintain the concentration of gas included in the cleaning liquid to the stable and optimum condition without relation to temperature changes or the like of the cleaning liquid by controlling capability of a vacuum pump for functioning a deairing module depending on the concentration of gas included in the cleaning liquid having passed the deairing module. SOLUTION: When a water supply pump 3 operates, the cleaning liquid in the supply source 1 is supplied to an ultrasonic wave application nozzle 14 via a supply pipe 2, a deairing module 4, a gas monitor 11 and a flow meter 12. In this case, an inverter 13 operates to drive a vacuum pump 8 with its output power. Thereby the deairing module 4 functions to isolate and remove the oxygen in the cleaning liquid. When the cleaning liquid from which oxygen is isolated and removed flows out of the deairing module 4, the concentration of oxygen existing in the cleaning liquid is detected with a gas monitor 11 and an output frequency of the inverter 31 is controlled to set the detection result to the value preset with the manipulation part 33.
申请公布号 JP2000228385(A) 申请公布日期 2000.08.15
申请号 JP19990028637 申请日期 1999.02.05
申请人 SHIBAURA MECHATRONICS CORP 发明人 SATO OSAMU
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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