发明名称 SUPPORTING MECHANISM OF SURFACE PLATE FOR POLISHING
摘要 PROBLEM TO BE SOLVED: To make surface processing uniformly and with a high flatness by preventing a surface plate from degradation in the shape resulting from thermal deformation of a hanger board and receptacle seat. SOLUTION: A heat insulation 5 is interposed between an upper surface plate 1 and a hanger board 12 of a hanging tool 10 for upper surface plate so as to shut off the heat path from the upper surface plate 1 to the hanger board 12. Use of such an upper surface plate hanging tool having high rigidity that a plurality of ribs are extending from a cylindrical portion radially at a certain spacing in the circumferential direction allows suppressing the static deformation even in case the surface plate 1 is made of Fe-Ni alloy, etc. It may also be acceptable that the heat insulation 5 is pinched between a lower surface plate and a receptacle seat. Accordingly the degree of flatness of the surface plate working area is well maintained during the processing, and a wafer can be finished into a uniform surface condition.
申请公布号 JP2000225563(A) 申请公布日期 2000.08.15
申请号 JP19990028802 申请日期 1999.02.05
申请人 SUPER SILICON KENKYUSHO:KK;HAMAI CO LTD;SHIN-HOKOKU STEEL CORP 发明人 OKAWA SHINJI;ABE KOZO;HAJIME TAKAFUMI;ISHIKAWA TOSHIBUMI;AOKI TOSHIMORI;SATO TAKEO
分类号 B24B37/12;H01L21/304 主分类号 B24B37/12
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