发明名称 |
Negative working photoresist composition |
摘要 |
A negative working photoresist composition which has high suitability for exposure to far ultraviolet and comprises an alkali-soluble resin, a compound capable of generating an acid upon irradiation with actinic rays or radiations, and a compound capable of lowering the solubility of the alkali-soluble resin in a developer in the presence of the acid, the alkali-soluble resin comprising a polymer containing at least the repeating units derived from norbornene skeleton-containing monomers and crosslinking groups.
|
申请公布号 |
US6103449(A) |
申请公布日期 |
2000.08.15 |
申请号 |
US19990229684 |
申请日期 |
1999.01.13 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SATO, KENICHIRO |
分类号 |
G03F7/004;G03F7/038;G03F7/039;H01L21/027;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|