发明名称 TRENCH INSULATED GATE BIPOLAR TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To improve saturation voltage to turn-off loss trade-off characteristics by constituting that a first conductivity drift layer appears on the main surface of a semiconductor substrate in the region in which the second conductivity well region is not formed. SOLUTION: Trenches 7 are formed with certain intervals on the main surface of one side of an n-type (a first conductive type) drift layer 1, a p-type (a second conductive type) well region 2 is selectively formed parallel to and in contact with this, and an (n) source region 3 is formed on a surface layer thereof. A part of the surface of the (n) source region 3 and the p-type (the second conductive type) well region 2 are removed and an insulating film 8 covers the main surface. Then, in the region in which the p-type (the second conductive type) well region 2 is not formed, the n-type (the first conductive type) drift layer 1 is allowed to reach the surface. In other words, a structure in which a part of the main surface is not covered with the p-type (the second conductive type) well region 2 is formed. The width of the n-type (the first conductive type) drift layer 1 should be about 80μm.
申请公布号 JP2000228519(A) 申请公布日期 2000.08.15
申请号 JP19990028392 申请日期 1999.02.05
申请人 FUJI ELECTRIC CO LTD 发明人 YOSHIKAWA ISAO
分类号 H01L29/78;H01L29/06;H01L29/739;(IPC1-7):H01L29/78 主分类号 H01L29/78
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