| 摘要 |
PROBLEM TO BE SOLVED: To improve overlay precision. SOLUTION: In a manufacturing method, an original and a substrate are controlled with respect to a projection optical system, so that the original and the substrate are positioned at a specific target position successively given via a profiler 307, thus performing the scanning exposure of the pattern of the substrate to exposure shot on the original, while scanning. In this case, each target position of the original or the substrate is corrected based on specific correction data (a direction overlay correction table) which is specified according to a scanning exposure position in the exposure shot by a target position correction means 308. |
