发明名称 Schottky diode of SiC and a method for production thereof
摘要 A Schottky diode of SiC has a substrate layer, a drift layer and emitter layer regions formed in the drift layer. A metal layer makes an ohmic contact to the emitter layer regions and Schottky contact to the drift layer. A depletion of the drift layer region between two adjacent emitter layer regions is allowed in the blocking state of the diode making the two adjacent p-type emitter layer regions form a continuous depleted region therebetween in this state.
申请公布号 US6104043(A) 申请公布日期 2000.08.15
申请号 US19970803380 申请日期 1997.02.20
申请人 ABB RESEARCH LTD. 发明人 HERMANSSON, WILLY;BIJLENGA, BO;RAMBERG, LENNART;ROTTNER, KURT;ZDANSKY, LENNART;HARRIS, CHRISTOPHER IAN;BAKOWSKI, MIETEK;SCHOENER, ADOLF;LUNDBERG, NILS;OESTLING, MIKAEL;DAHLQUIST, FANNY
分类号 H01L21/04;H01L29/24;H01L29/872;(IPC1-7):H01L31/031;H01L29/74;H01L27/095 主分类号 H01L21/04
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