| 摘要 |
PROBLEM TO BE SOLVED: To provide the positive radiation-sensitive composition having a resolution capable of microfabricating a subquarter micron pattern and high sensitivity by incorporating a polymer having specified structural units and a compound to be allowed to generate an acid by irradiation with radiation. SOLUTION: This composition contains the acid generator capable of generating an acid by irradiation with activated rays and the polymer having the structural units each represented by the formula in which X is a halogen atom, such as I, Br, Cl, or F, or a cyano group; Z is an O atom or an imino group; R is a primary or secondary 1-10C alkylene group, embodied by methylene, ethylene, or trimethylene; and A is an aryl group having at least one group to be decomposed and solubilized in alkali by action of an acid, especially preferably, an H atom of a phenolic hydroxyl group substituted by an acid- removing group. |
