SENSOR APPARATUS FOR PROCESS MEASUREMENT

摘要

A sensor apparatus is provided for transmitting electrical pulses from a signal line into a vessel to measure a process parameter. In one embodiment the sensor apparatus includes a lower flange configured to be coupled to the vessel and an upper flange configured to be coupled to the lower flange. Both lower and upper flanges are formed to include a central aperture defined by a tapered surface. The apparatus also includes a conductive probe element including a head having first and second tapered surfaces and an elongated conductive portion extending away from the head. The first tapered surface of the head is configured to engage the tapered surface of the lower flange to prevent movement of the probe element in a direction toward the lower flange. The tapered surface of the upper flange is configured to engage the second tapered surface of the probe element to prevent movement of the probe element in a direction toward the upper flange. The apparatus still further includes an electrical connector coupled to the probe element. Other embodiments include dielectric or metallic inserts and conductive pins coupled to the probe. In some embodiments, the dielectric insert has a tapered section to prevent movement of the probe. In some embodiments, the conductive pin has a tapered section to prevent movement of the probe. In one embodiment a spring provides an upwardly directed biasing force. In several embodiments the conductive pin or the connector includes an aperture and the other includes a pin which slidably engages the aperture to permit movement of the probe element while mounting electrical connection.