| 发明名称 |
Non-corrosive cleaning composition and method for removing photoresist and/or plasma etching residues |
| 摘要 |
Non-corrosive cleaning compositions that are useful for removing photoresist and/or plasma etch residues from a substrate. The cleaning composition comprises: (i) a hydroxy-(lower alkyl)-hydrazine, (ii) water, and (iii) at least one compound selected from the group consisting of a carboxylic acid, a water-miscible organic solvent and mixtures thereof.
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| 申请公布号 |
US6103680(A) |
申请公布日期 |
2000.08.15 |
| 申请号 |
US19980224493 |
申请日期 |
1998.12.31 |
| 申请人 |
ARCH SPECIALTY CHEMICALS, INC. |
发明人 |
HONDA, KENJI;ROTHGERY, EUGENE F. |
| 分类号 |
G03F7/42;B08B3/08;C11D7/26;C11D7/32;C11D7/34;C11D7/50;C11D7/60;C11D11/00;C11D17/00;H01L21/02;H01L21/027;H01L21/304;(IPC1-7):C11D3/30;C11D3/43 |
主分类号 |
G03F7/42 |
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