发明名称
摘要 PROBLEM TO BE SOLVED: To stop vapor deposition when frequency reaches the prescribed one and to complete the regulation of frequency even in the process of measuring frequency and treating on a computer part in a system in which the regulation of the frequency of piezoelectric elements such as quartz oscillators. SOLUTION: This fine regulating vapor deposition system has a oscillating circuit 5 applying voltage to a work 11 to excite oscillation, furthermore transforming the oscillation of the work 11 into an electrical signal and amplifying the same, a measuring apparatus 6 measuring the oscillation frequency of the work oscillated by the oscillating circuit 5 and a vapor depositing part 4 provided with a vapor depositing source 12 and a shutter 13 opening and shuttering the passage of metallic vapor to the work for vapor-depositing metal on the work, a vapor deposition control part 3 heating and cooling the vapor depositing source, furthermore, driving the shutter and controlling the vapor deposition and a computer part 1 controlling the action of the vapor deposition control part 3 based on the frequency measured by the measuring apparatus. In this case, the computer part 1 houses the time and measured frequency measured by the measuring apparatus 6, introduces a vapor deposition rate from the data of the frequency and time fetched before and calculates the remaining time till the regulated objective frequency.
申请公布号 JP3076278(B2) 申请公布日期 2000.08.14
申请号 JP19970213117 申请日期 1997.08.07
申请人 发明人
分类号 C23C14/24;H01L41/09;H01L41/22;H01L41/253;H03H3/04 主分类号 C23C14/24
代理机构 代理人
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