发明名称 HORIZONTAL INSULATION GATE BIPOLAR TRANSISTOR
摘要 PROBLEM TO BE SOLVED: To reduce the resistance of a gate electrode and increase a latchup preventive capability by formaing a metal interconnection layer on an emitter electrode through an insulation layer to make a contact between the metal interconnection layer and a gate electrode. SOLUTION: Connections 9b between gate electrodes 9 and 9a and contacts between the connections 9b and a gate interconnection 13 are each formed at three places along the longitudinal direction to allow gate current to flow into an aluminum-silicon interconnection through the nearest contact at the time of turn-off to reduce the resistance of the gate electrode 9 in the longitudinal direction. When connecting a plurality of unit insulation gate bipolar transistors IGBTs in parallel with each other, gate electrodes of each two adjacent unit transistors IGBTs can be easily connected through the gate interconnection 13, thereby uniforming the gate resistance of the entire IGBTs. As a result, an operating time of each unit transistor IGBT at the time of turn-off and that of the entire IGBTs can be uniformed to prevent the concentration of power and increase a latchup preventive capability.
申请公布号 JP2000223707(A) 申请公布日期 2000.08.11
申请号 JP19990026967 申请日期 1999.02.04
申请人 HITACHI LTD;HITACHI HARAMACHI SEMICONDUCTOR LTD 发明人 UCHIUMI TOMOYUKI;OZEKI SHOICHI;SUDA KOICHI
分类号 H01L29/78;H01L21/336;H01L29/423;H01L29/739 主分类号 H01L29/78
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