发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To enable columnar electrodes of a semiconductor device to absorb stresses. SOLUTION: A resin seal film 17 is formed, using a printing mask 14 and a squeegee 15. The mask 14 has a thickness adequately less than the height of columnar electrodes 12, and hence the top faces of the electrodes 12 are covered with the resin seal film 17 but the thickness of the seal film 17 between the columnar electrodes 12 is adequately less than the height of the columnar electrodes 12. Since the thickness of the seal film 17 between the columnar electrodes 12 is adequately less than the height of the columnar electrodes 12, the columnar electrodes 12 can absorb stresses, due to the thermal expansion coefficient difference between the Si substrate 11 and a circuit board in a temp. cycle test after mounting on the circuit board.
申请公布号 JP2000223519(A) 申请公布日期 2000.08.11
申请号 JP19990025971 申请日期 1999.02.03
申请人 CASIO COMPUT CO LTD 发明人 MIHARA ICHIRO;KUWABARA OSAMU
分类号 H01L21/60;H01L23/12;(IPC1-7):H01L21/60 主分类号 H01L21/60
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