发明名称 NITROGEN COMPOUND SEMICONDUCTOR ELEMENT
摘要 PROBLEM TO BE SOLVED: To form a thermally stable p-type electrode having a low resistance to achieve a low threshold current and a low operating voltage, prevent the deterioration, and increase the reliability by forming a metal contact layer, a metal barrier layer, and the p-type electrode on a p-type nitride compound semiconductor. SOLUTION: By forming a metal contact layer 10 made of Au or an alloy of Au and another metal on a p-type nitride compound semiconductor layer (GaX1InY1AlZ1: X1+Y1+Z1=1, 1<=X1, Y1, Z1<=1), the barrier is lowered. Moreover, the diffusion of metal from a p-side electrode 12 can be prevented by a metal barrier layer 11, increasing a carrier density on the surface of a p-side GaN contact layer 9, causing applied current to flow smoothly, and reducing a contact resistance. Part of metal in the metal contact layer 10 is diffused by heat treatment into the nitride compound semiconductor and is electrically activated and therefore a high carrier concentration can be expected.
申请公布号 JP2000223742(A) 申请公布日期 2000.08.11
申请号 JP19990021331 申请日期 1999.01.29
申请人 TOSHIBA CORP 发明人 NOZAKI CHIHARU;JOHN LENEY
分类号 H01L33/32;H01L33/40;H01S5/00;H01S5/042;H01S5/323;H01S5/343 主分类号 H01L33/32
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