| 摘要 |
<p>PROBLEM TO BE SOLVED: To facilitate the creation of a shot layout corresponding to real shots. SOLUTION: In an aligner and a device-manufacturing method, wherein a shot layout is created on the basis of prescribed information, substrates are respectively positioned at the position of each shot by stages on the basis of the shot layout and pattern parts in exposure areas, which are formed by limiting the range of an exposure, on a reticle pattern are exposed on the substrates, a shot layout is created as information on the position of a real shot, which is decided for each exposure area of the exposure areas 602 and 603, which are formed by limiting the range of the exposure, on the reticle pattern, the drawing of a shot layout showing areas, which are actually exposed, is displayed on the basis of information on the positions of real shots. Moreover, the stages are respectively positioned at the position of each shot, on the basis of information on the position of each shot on the created layout and information on the positions of the exposure areas, which are formed with a means for limiting the exposure areas, on the reticle pattern to perform exposure on the pattern parts on the substrates.</p> |
