发明名称 HEAT TREATMENT FURNACE
摘要 PROBLEM TO BE SOLVED: To prevent reaction byproducts from adhering to the lower section of a reaction furnace and acting as a particle source by making an opening for passing radiation heat from a heater in a port receiver thereby preventing the temperature at the lower section of the reaction furnace from decreasing. SOLUTION: An SiC plate having high thermal capacity is laid removably on the upper surface of a seal flange (bottom face of a reaction furnace) constituting the bottom part of a reaction furnace. A port receiver 7 has a substantially cross-shaped plan view provided with cuts (openings) 7a at four points of a disc. The cut 7a has a maximum size where the end part of a flange base does not project in the plan view and radiation heat generated above the port receiver 7 is passed through the openings 7a to a seal flange beneath the port receiver 7.
申请公布号 JP2000223482(A) 申请公布日期 2000.08.11
申请号 JP19990025510 申请日期 1999.02.02
申请人 KOKUSAI ELECTRIC CO LTD 发明人 HIRANO MITSUHIRO;TOMEZUKA KOJI
分类号 H01L21/22;H01L21/31;(IPC1-7):H01L21/31 主分类号 H01L21/22
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