发明名称 ELECTRONIC DEVICE MANUFACTURING APPARATUS AND METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To enable high-frequency electric powers to be applied to each of two pairs of electrodes installed in a vacuum vessel, without making plasma interfere with each other. SOLUTION: A vacuum vessel 1, equipped with a first pair of electrodes 2A and 3A and a second pair of electrodes 2B and 3B inside, a gas inlet 7 through which material gas in introduced into the vacuum vessel 1, and a first and a second power supply 4A and 4B, which apply pulse-modulated high-frequency voltages between the first electrodes 2A and 3A and between the second electrodes 2B and 3B respectively to cause plasma generation by discharging, and the first power supply 4A and the second power supply 4B are controlled so as not to make their voltage pulses overlap temporally with each other.
申请公布号 JP2000223424(A) 申请公布日期 2000.08.11
申请号 JP19990022274 申请日期 1999.01.29
申请人 SHARP CORP 发明人 MASHIMA NORIYUKI;NOMOTO KATSUHIKO
分类号 H01L21/302;C23C16/50;C23C16/505;C23C16/515;C23C16/52;H01J37/32;H01L21/205;H01L21/3065;H01L21/31;H01L21/311;(IPC1-7):H01L21/205;H01L21/306 主分类号 H01L21/302
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