发明名称 APPARATUS AND METHOD FOR DEFECT INSPECTION
摘要 PROBLEM TO BE SOLVED: To make possible sensitive inspection of defect such as fine contaminant and the like by illuminating a detected region on a substrate to be inspected with Gaussian beam flux shaped so as to obtain the maximum illuminance on the most outer perimeter of the detected region. SOLUTION: The beam diameter of a laser beam 106 is enlarged by means of a concave lens or convex lens 103, which is emitted from an illuminating source 101 comprising a laser source such as a semiconductor laser, an excimer laser and the like, or an electric-discharge tube such as xenon lamp, mercury lamp and the like, and the enlarged beam is converted into substantial collimated beam flux by means of a collimating lens 104. The substantial collimated beam flux converted with the collimating lens 104 is focused in the y axis direction, and the substrate 1 to be inspected is illuminated with a slit-shaped Gaussian beam flux 107 with approximate Gaussian distribution shaped so as to obtain the maximum illuminance on the most outer perimeter of the detected region by a cylindrical lens 105.
申请公布号 JP2000223541(A) 申请公布日期 2000.08.11
申请号 JP19990019035 申请日期 1999.01.27
申请人 HITACHI LTD 发明人 NOGUCHI MINORU;MAEDA SHUNJI;SHIBATA YUKIHIRO;NINOMIYA TAKANORI
分类号 H01L21/66;G01N21/88;G01N21/94;G01N21/95;G01N21/956;(IPC1-7):H01L21/66 主分类号 H01L21/66
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