发明名称 Trench bipolar transistor with insulated gate (IGBT) in which the MOS structure metal film is formed in trench of substrate surface section
摘要 The IGBT comprises a drift layer (1) of first conductivitiy, through zones (2) of second conductivity of surface region of drift layer, emitter zones (3) of first conductivity in trough zones, trenches (7) from emitter zones to drift layer, and gate electrode (10) in each trench buried in it with an intermediate gate insulating film. An emitter electrode is in contact with both emitter and trough zones, and a collector layer of second conductivity with a collector electrode (12) is deposited at the rear of drift layer. The trough zones are selectively structured, and the drift zone has sections extending between the trough zones.
申请公布号 DE10004548(A1) 申请公布日期 2000.08.10
申请号 DE20001004548 申请日期 2000.02.02
申请人 FUJI ELECTRIC CO., LTD. 发明人 YOSHIKAWA, KOH
分类号 H01L29/78;H01L29/06;H01L29/739;(IPC1-7):H01L29/739 主分类号 H01L29/78
代理机构 代理人
主权项
地址
您可能感兴趣的专利