发明名称 |
WORK PIECE CLEANING APPARATUS AND ASSOCIATED METHODS |
摘要 |
Apparatus and method for cleaning, rinsing and drying work pieces such as semiconductor wafers. The apparatus can be combined, in an integrated apparatus, with a CMP machine. The apparatus includes one or more brush boxes with water tracks to convey work pieces to and from the brush boxes. Each brush box and its associated water track provide for the containment of cleaning agents such as HF used in the cleaning process so that different cleaning agents used in different brush boxes are kept segregated. The efficiency of the brush box is enhanced by providing for movement of work pieces back and forth through the brush box. Thus work pieces can make more than one pass through a brush box.
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申请公布号 |
WO0046842(A2) |
申请公布日期 |
2000.08.10 |
申请号 |
WO2000US02709 |
申请日期 |
2000.02.02 |
申请人 |
SPEEDFAM-IPEC CORPORATION |
发明人 |
TROJAN, DANIEL;GOPALAN, PERIYA;MACERNIE, JON |
分类号 |
H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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地址 |
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