发明名称 Separating apparatus, separating method, and method of manufacturing semiconductor substrate
摘要 <p>When a bonded substrate stack prepared by bonding a first substrate in which a single-crystal Si layer is formed on a porous layer, and an insulating layer is formed on the single-crystal Si layer to a second substrate is to be separated at the porous layer, serrate defects at the peripheral portion of the separated substrates are prevented. A fluid is ejected from an ejection nozzle (112) and injected into the porous layer of a bonded substrate stack (30) while rotating the bonded substrate stack (30) about an axis (C) in a direction (R), thereby separating the bonded substrate stack (30) into two substrates at the porous layer. When the peripheral portion of the bonded substrate stack (30) is to be separated, the ejection nozzle (112) is located within a range (B). <IMAGE></p>
申请公布号 EP1026727(A2) 申请公布日期 2000.08.09
申请号 EP20000300718 申请日期 2000.01.31
申请人 CANON KABUSHIKI KAISHA 发明人 KURISU, HIROKAZU;OHMI, KAZUAKI;YONEHARA, TAKAO;SAKAGUCHI, KIYOFUMI;YANAGITA, KAZUTAKA
分类号 H01L27/12;H01L21/00;H01L21/02;H01L21/762;H01L21/763;(IPC1-7):H01L21/00 主分类号 H01L27/12
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