发明名称 |
Stable and low resistance metal/barrier/silicon stack structure and related process for manufacturing |
摘要 |
A metal-poly stack gate structure and associated method for forming a conductive barrier layer between W and poly in the metal-gate stack gate structure. The process includes the steps of depositing doped silicon on a substrate; forming nitride on the deposited silicon; depositing a metal on the nitride to form a metal/nitride/deposited silicon stack; and thermally treating the stack to transform the nitride into a conductive barrier layer between the metal and the deposited silicon. The thermal treatment transforms the nitride layer (SiNx or SiNxOy) into a conductive barrier (WSixNy or WSixNyOz) to form a W/barrier/poly stack gate structure. The barrier layer blocks reaction between W and Si, enhances sheet resistance, enhances adhesion between the W and the poly, and is stable at high temperatures.
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申请公布号 |
US6100188(A) |
申请公布日期 |
2000.08.08 |
申请号 |
US19980108474 |
申请日期 |
1998.07.01 |
申请人 |
TEXAS INSTRUMENTS INCORPORATED |
发明人 |
LU, JIONG-PING;HWANG, MING;ANDERSON, DICK N.;CARTER, DUANE E.;HSU, WEI-YUNG |
分类号 |
H01L21/28;H01L29/49;(IPC1-7):H01L21/44 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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