发明名称 Process for annealing a moving metal substrate
摘要 A process for annealing a moving metal substrate, especially a steel sheet. The process includes providing a gas under reduced pressure facing a first side of the substrate, creating a cold plasma in the gas by means of plasma discharges between the substrate and a counter electrode, the plasma being uniformly divided over the width of the substrate, and dissipating electrical power from the plasma discharges into the substrate, resulting in a uniform distribution of the density of power over the width of the substrate and a quick and uniform heating thereof
申请公布号 US6099667(A) 申请公布日期 2000.08.08
申请号 US19980021113 申请日期 1998.02.10
申请人 RECHERCHE ET DEVELOPPEMENT DU GROUPE COCKERILL SAMBRE 发明人 VANDEN BRANDE, PIERRE;WEYMEERSCH, ALAIN;HARLET, PHILIPPE
分类号 C21D1/09;C21D1/26;C21D1/38;C21D1/74;C21D1/773;C21D9/56;C23C14/02;C23C14/56;C23C16/02;C23C16/54;(IPC1-7):H01J37/32 主分类号 C21D1/09
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