发明名称 |
Process for annealing a moving metal substrate |
摘要 |
A process for annealing a moving metal substrate, especially a steel sheet. The process includes providing a gas under reduced pressure facing a first side of the substrate, creating a cold plasma in the gas by means of plasma discharges between the substrate and a counter electrode, the plasma being uniformly divided over the width of the substrate, and dissipating electrical power from the plasma discharges into the substrate, resulting in a uniform distribution of the density of power over the width of the substrate and a quick and uniform heating thereof
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申请公布号 |
US6099667(A) |
申请公布日期 |
2000.08.08 |
申请号 |
US19980021113 |
申请日期 |
1998.02.10 |
申请人 |
RECHERCHE ET DEVELOPPEMENT DU GROUPE COCKERILL SAMBRE |
发明人 |
VANDEN BRANDE, PIERRE;WEYMEERSCH, ALAIN;HARLET, PHILIPPE |
分类号 |
C21D1/09;C21D1/26;C21D1/38;C21D1/74;C21D1/773;C21D9/56;C23C14/02;C23C14/56;C23C16/02;C23C16/54;(IPC1-7):H01J37/32 |
主分类号 |
C21D1/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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